[14a-A28-1~10] 8.1 Plasma production and control

[14a-A28-5] Analysis of Target Erosion Profile in Rectangular Magnetron Sputtering Cathode by Three Dimensional Particle-in-Cell Monte Carlo Method

〇Yutaka Yabe¹, Kyosuke Kotera¹, Takefumi Yoshida¹, Shinichi Kubo¹, Osamu Takahashi¹, Kenichi Nanbu² (1.Showa Shinku Co., Ltd., 2.Institute of Fluid Science, Tohoku Univ.)

Keywords:3D PIC/MC,Magnetron Sputtering,Target Erosion Profile