[13p-P16-1~4] 13.1 Fundamental properties, surface and interface, and simulations ofSi related materials

[13p-P16-3] Conditions of wet etching process for Ga-In-O thin films

〇(B)Kuniaki Yoshida¹, Shuhei Fujioka¹, Ryosuke Goto¹, Takeyoshi Onuma^{1, 2}, Hiroki Nagai¹, Tomohiro Yamaguchi¹, Tohru Honda¹ (1.Kogakuin Univ., 2.TNCT.)

Keywords:Ga2O3,In2O3