The 62nd JSAP Spring Meeting, 2015

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8 Plasma Electronics » 8.4 Plasma etching

[14a-A27-1~15] 8.4 Plasma etching

Sat. Mar 14, 2015 9:00 AM - 1:00 PM A27 (6A-202)

9:00 AM - 9:15 AM

[14a-A27-1] Etching reaction of magnetic materials by CO cluster injection (2)

〇Kazuhiro Karahashi1, Toshio Seki2, Jiro Matsuo2, Satashi Hamaguchi1 (1.Osaka Univ., 2.Kyoto Univ.)

Keywords:cluster,MRAM