The 62nd JSAP Spring Meeting, 2015

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13 Semiconductors » 13.4 Si wafer processing /MEMS/Integration technology

[14p-A29-1~8] 13.4 Si wafer processing /MEMS/Integration technology

Sat. Mar 14, 2015 1:00 PM - 3:00 PM A29 (6A-204)

2:00 PM - 2:15 PM

[14p-A29-5] Half-Inch Silicon CVD Reactor Using Concentrated Infrared Light Heater (4)

〇NING LI1, HITOSHI HABUKA1, TAKANORI MIKAHARA2, SHIN-ICHI IKEDA2, 3, YUUKI ISHIDA2, 3, SHIRO HARA2, 3 (1.Yokohama National Univ., 2.MINIMAL, 3.AIST)

Keywords:epitaxial growth