Fluctuation factor analysis of a lithography process with MINIMAL equipment

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si wafer processing /MEMS/Integration technology

Sat. Mar 14, 2015 1:00 PM - 3:00 PM A29 (6A-204)

2:30 PM - 2:45 PM

〇Yuuji Kitayama¹, Syuuji Okuda¹, Yasuhide Higashino¹, Kouyu Houchi¹, Sommawan Khumpuang^1,², Shiro Hara^1,² (1.MINIMAL, 2.AIST)

Keywords:MINIMAL,Lithography