Naoya Okada

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Speaker, Author, Co-Author

Fri. Sep 16, 2016 9:00 AM - 12:15 PM B10 (Exhibition Hall)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[16a-B10-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

10:00 AM - 10:15 AM

[16a-B10-5] Low contact resistance in metal/n-Ge junctions by inserting W-germanide films synthesized by thermal chemical vapor deposition

〇Naoya Okada^1,2, Noriyuki Uchida², Toshihiko Kanayama² (1.JST-PRESTO, 2.AIST)