MASAMI MESUDA

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Speaker, Author, Co-Author

Fri. Sep 16, 2016 9:30 AM - 11:30 AM P5 (Exhibition Hall)

Poster presentation
| 15 Crystal Engineering
| 15.4 III-V-group nitride crystals

[16a-P5-1~32] 15.4 III-V-group nitride crystals

9:30 AM - 11:30 AM

[16a-P5-28] High crystalline GaN thin films by low O₂ GaN sputtering method

〇MASAMI MESUDA¹, HIDETO KURAMOCHI¹, TOKIO TAKAHASHI², MITSUAKI SHIMIZU² (1.Tosoh, 2.AIST)