Shuichi Kuboi

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Speaker, Author, Co-Author

Tue. Sep 13, 2016 9:00 AM - 11:45 AM B9 (Exhibition Hall)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[13a-B9-1~11] 8.4 Plasma etching

10:15 AM - 10:30 AM

[13a-B9-6] Investigation of plasma-induced damage in silicon trench structures

〇Shuichi Kuboi¹, Masashi Yamage¹, Satoshi Ishikawa¹ (1.CMC, Toshiba Corp.)