Tomohiro Kubota

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Speaker, Author, Co-Author

Tue. Sep 13, 2016 9:00 AM - 11:45 AM B9 (Exhibition Hall)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[13a-B9-1~11] 8.4 Plasma etching

11:00 AM - 11:15 AM

[13a-B9-9] CoFeB etching using neutral beam enhanced complex reaction

〇Tomohiro Kubota¹, Ryo Miyama², Yoshiyuki Kikuchi², Seiji Samukawa^1,3 (1.IFS, Tohoku Univ., 2.Tokyo Electron, 3.WPI-AIMR, Tohoku Univ.)

11:15 AM - 11:30 AM

[13a-B9-10] Mechanism of Ta etching using neutral beam enhanced complex reaction

〇Tomohiro Kubota¹, Momoji Kubo², Seiji Samukawa^1,3 (1.IFS, Tohoku Univ., 2.IMR, Tohoku Univ., 3.WPI-AIMR, Tohoku Univ.)