Yoshio Abe

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Speaker, Author, Co-Author

Wed. Sep 14, 2016 9:00 AM - 11:45 AM A37 (306-307)

Oral presentation
| 6 Thin Films and Surfaces
| 6.4 Thin films and New materials

[14a-A37-1~10] 6.4 Thin films and New materials

10:15 AM - 10:30 AM

[14a-A37-6] Preparation of nickel oxide thin films by low temperature sputtering using H₂O as a reactive gas

〇Yoshio Abe¹, Shun Yamauchi¹, Midori Kawamura¹, Kyung Ho Kim¹, Takayuki Kiba¹, Akira Narai² (1.Kitami Inst. Tech., 2.Kobe Steel Ltd.)