Keisuke Yasuta

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Speaker, Author, Co-Author

Wed. Sep 14, 2016 10:30 AM - 11:30 AM B7 (Exhibition Hall)

Oral presentation
| 13 Semiconductors
| 13.6 Semiconductor English Session

[14a-B7-1~4] 13.6 Semiconductor English Session

10:45 AM - 11:00 AM

▲ [14a-B7-2] Activation of Silicon by Ion Implantation under Heating Sample

〇Keisuke Yasuta¹, Masahiko Hasumi¹, Tomokazu Nagao², Yutaka Inouchi², Toshiyuki Sameshima¹ (1.TUAT, 2.NISSIN ION EQUIPMENT Co.)