Haruka Yamamoto

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Speaker, Author, Co-Author

Wed. Sep 14, 2016 1:30 PM - 5:45 PM A31 (302A)

Oral presentation
| 6 Thin Films and Surfaces
| 6.3 Oxide electronics

[14p-A31-1~16] 6.3 Oxide electronics

2:15 PM - 2:30 PM

△ [14p-A31-4] Tailoring the crystal structure of TiO₂ films deposited by reactive sputtering (1);
Selective rutile growth by controlling the sputtering parameters or Sn-doping

〇(M1)Haruka Yamamoto¹, Junjun Jia¹, Haruka Kotake¹, Shin-ichi Nakamura¹, Toshihiro Okajima², Masaaki Imura³, Toshimasa Kanai³, Yozo Shigesato¹ (1.Aoyama Gakuin Univ., 2.Kyushu Synchrotron Light Research Center, 3.Nippon Electric Glass Co., Ltd)