Hiroyoshi Nishiyama

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Speaker, Author, Co-Author

Wed. Sep 14, 2016 1:30 PM - 5:45 PM A31 (302A)

Oral presentation
| 6 Thin Films and Surfaces
| 6.3 Oxide electronics

[14p-A31-1~16] 6.3 Oxide electronics

2:30 PM - 2:45 PM

[14p-A31-5] Tailoring the crystal structure of TiO₂ films deposited by reactive sputtering (2);
Selective anatase growth by Nb or N dopings

〇Hiroyoshi Nishiyama¹, Junjun Jia¹, Shin-ichi Nakamura¹, Toshihiro Okajima², Masaaki Imura³, Toshimasa Kanai³, Yuzo Shigesato¹ (1.Aoyama Gakuin Univ, 2.kyushu Synchrotron Light Research Center, 3.Nippon Electric Glass Co., Ltd.)