Haochun Tang

→ Search for Haochun Tang in Google Scholar

Speaker, Author, Co-Author

Thu. Sep 15, 2016 9:00 AM - 12:15 PM B10 (Exhibition Hall)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[15a-B10-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

12:00 PM - 12:15 PM

▲ [15a-B10-13] High Mechanical Strength in Gold Films Electroplated with Supercritical Carbon Dioxide for MEMS Applications

〇(D)Haochun Tang¹, Chun-Yi Chen^1,2, Tso-Fu Mark Chang^1,2, Daisuke Yamane^1,2, Katsuyuki Machida^1,2,3, Kazuya Masu^1,2, Masato Sone^1,2 (1.IIR Tokyo Tech, 2.CREST JST, 3.NTT AT Corp.)

▲