Ryosuke Nakashima

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Speaker, Author, Co-Author

Thu. Sep 15, 2016 9:00 AM - 12:15 PM B10 (Exhibition Hall)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[15a-B10-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

9:15 AM - 9:30 AM

[15a-B10-2] High Speed Crystallization of Silicon Thin Films Induced by High Power Atmospheric Pressure Thermal-Plasma-Jet Irradiation

〇Ryosuke Nakashima¹, Ryota Shin¹, Hiroaki Hanahusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)