Takashi Oinoue

→ Search for Takashi Oinoue in Google Scholar

Speaker, Author, Co-Author

Thu. Sep 15, 2016 10:00 AM - 12:15 PM B2 (Exhibition Hall)

Oral presentation
| 13 Semiconductors
| 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[15a-B2-1~8] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

10:45 AM - 11:00 AM

[15a-B2-4] Behavior analysis of Si etching process with the HF/HNO3 mixture by single spin wafer processor

〇Takashi Oinoue¹, Suguru Saito², Atsushi Okuyama², Yoshiya Hagimoto², Hayato Iwamoto² (1.Sony Semiconductor Manufacturing, 2.Sony Semiconductor Solutions)

▲