Satomi Ishida

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Speaker, Author, Co-Author

Thu. Sep 15, 2016 9:30 AM - 11:30 AM P8 (Exhibition Hall)

Poster presentation
| 3 Optics and Photonics
| 3.15 Silicon photonics

[15a-P8-1~12] 3.15 Silicon photonics

9:30 AM - 11:30 AM

[15a-P8-1] Temperature dependence of enhanced biaxial tensile strain of Ge layer grown on SOI substrate by using residual strain and microstructures

〇Satomi Ishida¹, Satoshi Kako^1,2, Katsuya Oda³, Satoshi Iwamoto^1,2, Yasuhiko Arakawa^1,2 (1.IIS, RCAST Tokyo Univ., 2.NanoQuine Tokyo Univ., 3.HITACHI R&D Group)

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