Yoshihiro Koga

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Speaker, Author, Co-Author

Thu. Sep 15, 2016 1:15 PM - 6:45 PM A23 (201B)

Oral presentation
| 15 Crystal Engineering
| 15.8 Crystal evaluation, impurities and crystal defects

[15p-A23-1~20] 15.8 Crystal evaluation, impurities and crystal defects

2:30 PM - 2:45 PM

[15p-A23-6] Characteristic of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (2)
-Trapping Ability of Oxygen by Bonded Region between Epitaxial Layer and Silicon Substrate at Room Temperature (2)-

〇Yoshihiro Koga¹, Kazunari Kurita¹ (1.SUMCO CORPORATION)