Ryo Hirose

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Speaker, Author, Co-Author

Thu. Sep 15, 2016 1:15 PM - 6:45 PM A23 (201B)

Oral presentation
| 15 Crystal Engineering
| 15.8 Crystal evaluation, impurities and crystal defects

[15p-A23-1~20] 15.8 Crystal evaluation, impurities and crystal defects

2:45 PM - 3:00 PM

△ [15p-A23-7] Characteristics of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers(3) - Development study of multi-element molecular ion implantation technique (2) -

〇Ryo Hirose¹, Ryosuke Okuyama¹, Takeshi Kadono¹, Ayumi Masada¹, Yoshihiro Koga¹, Hidehiko Okuda¹, Kazunari Kurita¹, Naoki Miyamoto² (1.SUMCO CORPORATION, 2.NISSIN ION EQUIPMENT CO,.LTD.)

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