Hiroyuki Ota

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Speaker, Author, Co-Author

Thu. Sep 15, 2016 1:15 PM - 5:45 PM B9 (Exhibition Hall)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[15p-B9-1~17] 13.3 Insulator technology

2:00 PM - 2:15 PM

[15p-B9-4] Influence of Impurity Oxygen in Metal TiN on Formation of Ferroelectric Hf_0.5Zr_0.5O₂

〇Hiroyuki Ota¹, Shinji Migita¹, Estuo Kurosawa¹, Akira Toriumi² (1.AIST, 2.The Univ. of Tokyo)