Norihisa Takei

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Speaker, Author, Co-Author

Fri. Sep 16, 2016 1:15 PM - 4:45 PM B7 (Exhibition Hall)

Oral presentation
| 8 Plasma Electronics
| 8.3 deposition of thin film and surface treatment

[16p-B7-1~13] 8.3 deposition of thin film and surface treatment

2:45 PM - 3:00 PM

△ [16p-B7-7] Si epitaxial growth using on-site SiH₄ generator by narrow gap high density hydrogen plasma

〇(M1)Norihisa Takei¹, Fumiya Shinoda¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹, Hiromasa Ohmi¹ (1.Osaka Univ.)