[13a-B9-1~11] 8.4 Plasma etching

[13a-B9-6] Investigation of plasma-induced damage in silicon trench structures

〇Shuichi Kuboi¹, Masashi Yamage¹, Satoshi Ishikawa¹ (1.CMC, Toshiba Corp.)

Keywords:trench, plasma, damage

Distribution of plasma-induced damage in silicon trench structures was investigated by measuring the Dark Current generated from defects in the silicon.