Analyses of Ni sputtering by energetic ions from CO plasmas

Presentation information

Oral presentation

8 Plasma Electronics » 8.4 Plasma etching

Tue. Sep 13, 2016 9:00 AM - 11:45 AM B9 (Exhibition Hall)

10:45 AM - 11:00 AM

〇Akito Kumamoto¹, Nicolas Mauchamp¹, Michiro Isobe¹, Kohei Mizotani¹, Hu Li¹, Tomoko Ito¹, Kazuhiro Karahashi¹, Satoshi Hamaguchi¹ (1.Osaka Univ.)

Keywords:Ni sputtering