[13p-C31-1~11] 7.1 X-ray technologies

[13p-C31-6] Thickness Distribution Control in Magnetron Sputtering Apparatus

〇(M1)Akinori Kaneko¹, Mitsunori Toyoda¹, Masaki Takata¹ (1.IMRAM, Tohoku Univ.)

Keywords:extreme ultraviolet, soft X-rays, microscope

To realize practical high throughput of Schwarzschild imaging objective in extreme ultraviolet (EUV) region, firstly, we need spherical-multilayer mirrors that can provide high reflectivity resulting from the Bragg reflection on entire mirror surface. Since an incident angle would change as a function of radial coordinate of the light ray, it is necessary to control thickness distribution of a multilayer coating on spherical mirror substrates . In this study, we developed novel thickness control mechanism for a magnetron sputtering apparatus, in which the thickness distribution can be adjust by modifying rotation and revolution movement of the mirror substrate. In the presentation, we report first experimental results of distribution control given with the novel system by fabricating a Mo/Si multilayer mirror for an operating wavelength of 13.5 nm.