The 77th JSAP Autumn Meeting, 2016

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[14a-A37-1~10] 6.4 Thin films and New materials

Wed. Sep 14, 2016 9:00 AM - 11:45 AM A37 (306-307)

Hideyuki Kawasoko(Tohoku Univ.)

10:00 AM - 10:15 AM

[14a-A37-5] Deposition and evaluation of CeO2/SiO2 film by MOCVD

〇Kensuke Kikuchi1, Tomonari Furuya1, Setsu Suzuki2, Keiji Ishibashi2, Yasuhiro Yamamoto1 (1.Hosei Univ., 2.Comet Inc.)

Keywords:dielectric, high-k film