[14a-A37-1~10] 6.4 Thin films and New materials

[14a-A37-6] Preparation of nickel oxide thin films by low temperature sputtering using H₂O as a reactive gas

〇Yoshio Abe¹, Shun Yamauchi¹, Midori Kawamura¹, Kyung Ho Kim¹, Takayuki Kiba¹, Akira Narai² (1.Kitami Inst. Tech., 2.Kobe Steel Ltd.)

Keywords:sputtering, electrochromic, nickel oxide thin film

Nickel oxide thin films were sputter deposited on substrates cooled by liquid nitrogen, and their electrochromic properties were studied.
From XRD measurement, it is considered that composited films of oxide and metal were formed. Electrochromic properties with a transmittance change from 12 to 20% were observed for the film at a wavelength of 600 nm.