Activation of Silicon by Ion Implantation under Heating Sample

Presentation information

Oral presentation

13 Semiconductors » 13.6 Semiconductor English Session

Wed. Sep 14, 2016 10:30 AM - 11:30 AM B7 (Exhibition Hall)

10:45 AM - 11:00 AM

〇Keisuke Yasuta¹, Masahiko Hasumi¹, Tomokazu Nagao², Yutaka Inouchi², Toshiyuki Sameshima¹ (1.TUAT, 2.NISSIN ION EQUIPMENT Co.)

Keywords:Ion implantation, Activaiton