[14a-B7-1~4] 13.6 Semiconductor English Session

▲ [14a-B7-2] Activation of Silicon by Ion Implantation under Heating Sample

〇Keisuke Yasuta¹、Masahiko Hasumi¹、Tomokazu Nagao²、Yutaka Inouchi²、Toshiyuki Sameshima¹ (1.TUAT、2.NISSIN ION EQUIPMENT Co.)

キーワード：Ion implantation, Activaiton