[14a-P2-1~13] 3.8 Optical measurement, instrumentation, and sensor

[14a-P2-9] Chemical dry etching of polymer layer using the mixed CF₄/O₂ gas for improvement the side-wall roughness and high sensitivity SPR Sensor

〇(M1)Hiroki Tansho¹, Shota Konuma¹, Yuichi Matsushima², Hiroshi Ishikawa¹, Katsuyuki Utaka¹ (1.Waseda Univ. Faculty of Science and Engineering., 2.GCS Research Organization.)

Keywords:surface plasmon resonance, photodetector, dry etching

We proposed the double-reflection waveguide-type Kretschmann-structure SPR sensor.In this paper, we reported the new fabrication process using the mixed gas of CF4 and O2 high reactivity gas. We considered Cu resist mask through such hard chemical dry etching. We realized our device structure and expected device characteristics.