The 77th JSAP Autumn Meeting, 2016

Presentation information

Poster presentation

13 Semiconductors » 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[14p-P5-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

Wed. Sep 14, 2016 1:30 PM - 3:30 PM P5 (Exhibition Hall)

1:30 PM - 3:30 PM

[14p-P5-13] Electrodeposition of Crystalline-silicon on Metal-substrate from SiO2 in Molten-salt

Muhammad Monirul Islam1, Takeaki Sakurai1, Katsuhiro Akimoto1 (1.Tsukuba Univ.)

Keywords:silicon, electrodeposition, photovoltaic

Most of the commercial solar cells are based on silicon (Si) which is most abundant solar energy material in form of silicates and silica (SiO2). Thus, production cost of Si has significant impact on the application of solar electricity for the general people. For the fabrication of solar cell Si with 99.9999% (6N) is necessary which is called solar-grade silicon (SOG-Si) However, there remain several challenges in the current production of Si using carbothermic reduction which is associated with huge energy consumption and carbon-di-oxide emission.
We aim to study formation of Si layer through reduction of SiO2 using alternative method comparing to carbothermic process. We aim for the electrodeposition of SOG-Si films on low-cost substrate from of SiO2-powder through electrochemical-reduction.