〇Shogo Tamaki¹, Koji Terawaki¹, Yuichiro Kimoto¹, Kohei Kamada¹, Hiromasa Ohmi¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹ (1.Graduate School of Engineering, Osaka University)

〇Ryosuke Nakashima¹, Ryota Shin¹, Hiroaki Hanahusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

〇Ryutatsu Mizukami¹, Shinji Takashima¹, Tomonori Yamashita¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

〇WENCHANG YEH¹ (1.Shimane Univ.)

〇hidenori higashi¹, Mario Nakano¹, Kohei Kudo¹, Yuichi Fujita¹, Shinya Yamada¹, Takeshi Kanashima¹, Isao Tsunoda², Hiroshi Nakashima³, Kohei Hamaya¹ (1.Osaka Univ., 2.NIT, Kumamoto College., 3.KASTEC, Kyushu Univ.)

〇Hiroki Ohsawa¹, Akito Hara¹ (1.Tohoku Gakuin Univ.)

〇Daisuke Hishitani¹, Yasuaki Ishikawa¹, Hiroshi Ikenoue², Miki Trifunovic³, Ryoichi Ishihara³, Tatsuya Shimoda⁴, Yukiharu Uraoka¹ (1.NAIST, 2.Kyushu univ., 3.TU Delft, 4.JAIST)

〇Jin Suzuki¹, Tianxi Yang¹, Tatsuya Okada¹, Takashi Noguchi¹, Naoya Kawamoto² (1.Ryukyu Univ., 2.Yamaguchi Univ.)

〇Takahiro Suzuki¹, Ryo Yokogawa¹, Kazuya Takahashi², Katsuhiko Komori², Tamotsu Morimoto³, Naomi Sawamoto¹, Atsushi Ogura¹ (1.Meiji Univ., 2.Tokyo Electron Tohoku Ltd., 3.Tokyo Electron Ltd.)

〇ryo yokogawa¹, Takahiro Suzuki¹, Ryota Suzuki¹, Kazuya Takahashi², Katsuhiko Komori², Tamotsu Morimoto³, Naomi Sawamoto¹, Atsushi Ogura¹ (1.Meiji Univ., 2.Development Dept., Tokyo Electron Tohoku Ltd., 3.Tokyo Electron Ltd.)

〇Yukinobu Numata¹, Daisuke Hiramatsu¹, Katsuaki Nakano¹ (1.ULVAC, Inc.)

〇Norio Ishitsuka¹, Noriyuki Sakuma¹ (1.Hitachi R&D Group)

〇(D)Haochun Tang¹, Chun-Yi Chen^1,2, Tso-Fu Mark Chang^1,2, Daisuke Yamane^1,2, Katsuyuki Machida^1,2,3, Kazuya Masu^1,2, Masato Sone^1,2 (1.IIR Tokyo Tech, 2.CREST JST, 3.NTT AT Corp.)

〇Kazuhiro Hane¹, Takashi Sasaki¹, Borriboon Thubthimthong¹ (1.Tohoku Univ.)

〇YuanHsuan Jhang¹, Katsuaki Tanabe^2,3, Bongyong Jang¹, Satoshi Iwamoto^1,2, Yasuhiko Arakawa^1,2 (1.IIS, UT, 2.NanoQuine, UT, 3.Kyoto Univ.)

〇(M1)Mitsuki Kuwabara¹, Yasushi Takahashi¹ (1.Osaka Pref. Univ.)

〇Katsuhiro Suzuki¹, Hiroaki Nishiyama¹ (1.Gad. Yamagata Univ.)

〇Takafumi Kuboyama¹, Shinpei Ogawa², Daisuke Fujisawa², Masafumi Kimata¹ (1.Ritsumeikan Univ., 2.Mitsubishi Electric Corp.)

〇Shinpei Ogawa¹, Daisuke Fujisawa¹, Takafumi Kuboyama², Masafumi Kimata² (1.Mitsubishi Electric Corp., 2.Ritsumeikan Univ.)

〇(M1)Toshiaki Takahashi¹, Yoshihiro Masuya¹, Hayato Ishida¹, Takeshi Hizawa¹, Kazuhiro Takahashi¹ (1.Toyohashi Tech.)

〇TERUAKI SAFU¹, Toshifumi Konishi¹, Daisuke Yamane^2,4, Hiroshi Toshiyoshi^3,4, Masato Sone^2,4, Kazuya Masu^2,4, Katsuyuki Machida^1,4 (1.NTT-AT, 2.Tokyo Institute of Technology, 3.The Univ. of Tokyo, 4.JST-CREST)

〇(D)Kenta Nakazawa¹, Takashi Sasaki¹, Hiromasa Furuta², Jiro Kamiya², Hideki Sasaki², Toshikazu Kamiya², Kazuhiro Hane¹ (1.Tohoku Univ., 2.Panasonic Industrial Devices SUNX)

〇Shinichi Ogawa¹, Tomohiko Iijima¹ (1.AIST)

〇Yuji Okamoto^1,2, Daiki Tsutsumi³, Takamasa Ishigaki³, Fatima Zohra Dahmani⁴, Masatomo Sumiya² (1.Tsukuba Univ., 2.NIMS, 3.Hosei Univ., 4.USTO-MB.)

〇Toru Watanabe¹, Hitoshi Habuka¹, Ayumi Saito¹ (1.Yokohama Nat. Univ.)

Ayumi Saito¹, 〇AYAMI YAMADA¹, Hitoshi Habuka¹ (1.Yokohama Nat. Univ.)

〇Takuya Toma¹, Akira Suwa¹, Daisuke Nakamura¹, Hiroshi Ikenoue¹ (1.Kyushu Univ.)

〇Yohei Sugawara¹, Hisashi Kino², Takafumi Fukushima¹, Kang-Wook Lee³, Mitumasa Koyanagi³, Tetsu Tanaka^1,4 (1.Graduate School of Engineering of Tohoku Univ., 2.FRIS, Tohoku Univ., 3.NICHe, Tohoku Univ., 4.Graduate School of Biomedical Engineering of Tohoku Univ.)

〇Katsuya Furuna¹, Jianbo Liang¹, Moeko Matsubara², Marwan Dhamrin², Yoshitaka Nishio², Naoteru Shigekawa¹ (1.Osaka City Univ., 2.Toyo Aluminium K.K.)

〇Tomoki Ogawa¹, Jianbo Liang¹, Kenji Araki², Takefumi Kamioka², Naoteru Shigekawa¹ (1.Osaka City Univ., 2.Toyota Technol. Inst.)

〇Hideaki Tanimura¹, Hikaru Kawarazaki¹, Shinichi Kato¹, Takayuki Aoyama¹, Ippei Kobayashi¹, Hiroshi Onoda², Yoshiki Nakashima², Tsutomu Nagayama², Nariaki Hamamoto², Shigeki Sakai² (1.SCREEN Semiconductor Solutions Co., Ltd., 2.Nissin Ion Equipment Co., Ltd.)

〇Hikaru Kawarazaki¹, Hideaki Tanimura¹, Shinichi Kato¹, Takayuki Aoyama¹, Ippei Kobayashi¹, Hiroshi Onoda², Yoshiki Nakashima², Tsutomu Nagayama², Nariaki Hamamoto², Shigeki Sakai² (1.SCREEN Semiconductor Solutions, 2.NISSIN ION EQUIPMENT)

〇Kotaro Natori¹, Kazuo Tsutsui¹, Tomohiro Matsushita², Takayuki Muro², Toyohiko Kinoshita², Takuya Hoshii¹, Kuniyuki Kakushima¹, Hitoshi Wakabayashi¹, Fumihiko Matsui³, Masaru Shimomura⁴ (1.Tokyo Tech., 2.JASRI, 3.Nara Inst of Sci. and Technol., 4.Shizuoka Univ.)

〇Hayato Okamoto¹, Keisuke Yamamoto², Dong Wang¹, Hiroshi Nakashima² (1.IGSES, Kyushu Univ., 2.KASTEC, Kyushu Univ.)

〇Naoya Okada^1,2, Noriyuki Uchida², Toshihiko Kanayama² (1.JST-PRESTO, 2.AIST)

〇Akihiro Suzuki^1,2, Shota Toda¹, Osamu Nakatsuka¹, Mitsuo Sakashita¹, Shigeaki Zaima^1,3 (1.Grad. Sch. of Eng., Nagoya Univ.,, 2.The Research Fellow of JSPS, 3.IMaSS, Nagoya. Univ.)

〇Ryutaro Suda¹, Mamiko Yagi¹, Akira Kojima¹, Jun-ichi Shirakashi¹, Nobuyoshi Koshida¹ (1.Tokyo Univ. of Agri. & Technol.)

〇Shintaro Otsuka¹, Mori Takahiro¹, Morita Yukinori¹, Uchida Noriyuki¹, Liu Yongxun¹, O'uchi Shin-ichi¹, Fuketa Hiroshi¹, Migita Shinji¹, Masahara Meisyoku¹, Matsukawa Takashi¹ (1.AIST)

〇Noriyuki Uchida¹, Yoshinobu Miyazaki¹, Tatsuro Maeda¹, Kouichi Fukuda¹, Junichi Hattori¹, YUji Ohishi², Manabu Ishimaru⁴, Ruben R. Lieten³, Jean-Pierre Locquet³ (1.NERI-AIST, 2.Osaka univ., 3.KU Leuven, 4.Kyutech)

〇Shuichi Noda¹, En-Tzu Lee¹, Wataru Mizubayashi², Kazuhiko Endo², Seiji Samukawa^1,2 (1.Tohoku Univ., 2.AIST)

〇Takashi Yajima^1,2, Masaharu Yasui^1,2, Sommawan Khumpuang^1,2, Hitoshi Maekawa^1,2, Shiro Hara^1,2 (1.AIST, 2.Minimal Fab)

〇Takashi Yajima^1,2, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.Minimal Fab)

〇Sommawan Khumpuang^1,2, Fumito Imura^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL)

〇Norio Umeyama^1,2, Takaaki Sakai³, Atsushi Kajikura³, Kouichiro Ichikawa³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.Fujikoshi Machinery)

〇Yuuki Ishida^1,2, Takanori Mikahara^1,2, Noriko Miura², Takahiro Ito³, Shinichi Ikeda^1,2, Hitoshi Habuka⁴, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.ORIENTAL MOTER Co, 4.YNU)

〇Miya Matsuo¹, Hitoshi Habuka¹, Ayami Yamada¹, Ning Li¹, Takanori Mikahara², Shin-ichi Ikeda^2,3, Yuuki Ishida^2,3, Shiro Hara^2,3 (1.Yokohama Nat. Univ., 2.MINIMAL, 3.AIST)

〇NING LI¹, MIYA MATSUO¹, HITOSHI HABUKA¹, TAKANORI MIKAHARA², SHIN-ICHI IKEDA^2,3, YUUKI ISHIDA^2,3, SHIRO HARA^2,3 (1.Yokohama National Univ., 2.MINIMAL, 3.AIST)

〇Hiroyuki Tanaka^1,2, Takuya Koga², Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL)

〇TAKUYA KITANO¹, HIROAKI SUZUKI¹, ARUFUA SHIOTA¹, TATSUO ISHIJIMA¹, YASUNORI TANAKA¹, YOSHIHIKO UESUGI¹, SOMMAWAN KHUMPUANG^2,3, SHIRO HARA^2,3 (1.Kanazawa Univ., 2.MINIMAL, 3.AIST)

〇Hiroyuki Tanaka^1,2, Hisato Ogiso^1,2, Shizuka Nakano^1,2, Toshihiro Hayami³, Toshiya Miyazaki³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.SPPT)

〇Noriko Miura¹, Fumito Imura^1,2, Takeshi Yamada^1,3, Takeshi Aizawa^1,3, Shinichi Ikeda^1,2, Yuuki Ishida^1,2, Takanori Mikahara^1,2, Yasuhiro Onishi^1,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.MINIMAL, 2.AIST, 3.YONEKURA)

〇kazushige sato¹, takashi chiba^1,3, masao terada^1,3, ikeda shinichi^1,2, Sommawan Khumpuang^1,2, shiro hara^1,2 (1.Minimal Fab Development Association, 2.AIST, 3.Sakaguchi E.H VOC Corp.)

〇Kazuhiro Koga^1,2, Fumito Imura^1,2, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL)

〇Yongxun Liu¹, Sommawan Khumpuang¹, Masayoshi Nagao¹, Takashi Matsukawa¹, Shiro Hara¹ (1.AIST)

〇Fumito Imura^1,2, Michihiro Inoue¹, Arami Saruwatari^1,2, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.Minimal Fab)

〇Toshifumi Konishi¹, Daisuke Yamane^2,4, Hiroyuki Ito^2,4, Shiro Dosho^2,4, Noboru Ishihara^2,4, Hiroshi Toshiyoshi^3,4, Kazuya Masu^2,4, Katsuyuki Machida^1,4 (1.NTT-AT, 2.Tokyo Tech., 3.Univ. of Tokyo, 4.JST-CREST)

〇Daisuke Yamane^1,4, Toshifumi Konishi², Teruaki Safu², Masato Sone^1,4, Hiroshi Toshiyoshi^3,4, Kazuya Masu^1,4, Katsuyuki Machida^2,4 (1.Tokyo Tech., 2.NTT-AT, 3.The Univ. of Tokyo, 4.JST-CREST)

〇Daisuke Yamane^1,4, Toshifumi Konishi², Teruaki Safu², Hiroyuki Ito^1,4, Shiro Dosho^1,4, Noboru Ishihara^1,4, Masato Sone^1,4, Hiroshi Toshiyoshi^3,4, Kazuya Masu^1,4, Katsuyuki Machida^2,4 (1.Tokyo Tech., 2.NTT-AT, 3.The Univ. of Tokyo, 4.JST-CREST)

〇Shuichi Murakami¹, Ryo Iwaki², Kazuo Satoh¹, Tsunehisa Tanaka¹, Mayumi Uno¹, Takashi Tateno² (1.TRI-Osaka, 2.Graduate School of Sci. and Tech., Hokkaido Univ.)

〇(P)YongJun Seo^1,2, Kazuya Harii^1,3, Ryo Takahashi^1,3, Hiroyuki Chudo^1,3, Koichi Oyanagi⁴, Zhiyong Qiu², Takahito Ono⁵, Yuki Shiomi^1,4, Eiji Saitoh^1,2,3,4 (1.ERATO SQR project, 2.AIMR, 3.JAEA, 4.IMR, 5.Tohoku Univ.)

〇(B)Takahiro Mitsuishi¹, Masahiro Akiyama¹, Dali Zhang², Myung-Jae Lee², Edoardo Charbon² (1.NIT, 2.TUDelft)

〇Akito Hara¹, Yuya Nishimura¹, Hiroki Ohsawa¹ (1.Tohoku Gakuin Univ.)

Mako Kumeuchi¹, Shinya Kumagai¹, Hyungjun Cho², Hiroki Kondo², Kenji Ishikawa², Masaru Hori², 〇Minoru Sasaki¹ (1.Toyota Tech. Inst., 2.Nagoya Univ.)

〇Reo Kometani¹, Takahiro Murakami¹, Etsuo Maeda¹ (1.The Univ. of Tokyo)

〇Masato Okuno¹, Reo Kometani¹, Etsuo Maeda¹ (1.The Univ. of Tokyo)

〇(M2)atsuhiro yamada¹, koji sueoka¹ (1.Okayama Pref Univ.)

〇Kazushi Miki^1,2, Koichi Murata^1,2, Takashi Kanazawa^1,2, Hiroya Tanaka³, Koh'ichi Nittoh^1,2, Shinya Ohno³, Masatoshi Tanaka³ (1.NIMS, 2.Univ. of Tsukuba, 3.YNU)

〇Muhammad Monirul Islam¹, Takeaki Sakurai¹, Katsuhiro Akimoto¹ (1.Tsukuba Univ.)