Noriko Miura

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Speaker, Author, Co-Author

Fri. Sep 16, 2016 1:45 PM - 5:00 PM B10 (Exhibition Hall)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[16p-B10-1~12] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

3:45 PM - 4:00 PM

[16p-B10-8] Electrical Characteristics of Gate Thermal Oxide Processed by Minimal Focused Light Heating Furnace

〇Noriko Miura¹, Fumito Imura^1,2, Takeshi Yamada^1,3, Takeshi Aizawa^1,3, Shinichi Ikeda^1,2, Yuuki Ishida^1,2, Takanori Mikahara^1,2, Yasuhiro Onishi^1,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.MINIMAL, 2.AIST, 3.YONEKURA)

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