Hikaru Kawarazaki

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Speaker, Author, Co-Author

Fri. Sep 16, 2016 9:00 AM - 12:15 PM B10 (Exhibition Hall)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[16a-B10-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

9:15 AM - 9:30 AM

[16a-B10-2] Shallow and high activated junctions in n+/p Ge using FLA and O knocked on effect

〇Hikaru Kawarazaki¹, Hideaki Tanimura¹, Shinichi Kato¹, Takayuki Aoyama¹, Ippei Kobayashi¹, Hiroshi Onoda², Yoshiki Nakashima², Tsutomu Nagayama², Nariaki Hamamoto², Shigeki Sakai² (1.SCREEN Semiconductor Solutions, 2.NISSIN ION EQUIPMENT)

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