Shuichi Noda

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Speaker, Author, Co-Author

Fri. Sep 16, 2016 9:00 AM - 12:15 PM B10 (Exhibition Hall)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[16a-B10-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

11:15 AM - 11:30 AM

[16a-B10-10] Investigation of Etching Mechanism of Germanium by Chlorine Neutral Beam

〇Shuichi Noda¹, En-Tzu Lee¹, Wataru Mizubayashi², Kazuhiko Endo², Seiji Samukawa^1,2 (1.Tohoku Univ., 2.AIST)