The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[15a-A21-1~11] 15.4 III-V-group nitride crystals

Thu. Sep 15, 2016 9:00 AM - 12:00 PM A21 (Main Hall A)

Toru Akiyama(Mie Univ.), Yoshihiro Kangawa(Kyushu Univ.)

10:45 AM - 11:00 AM

[15a-A21-7] Rapid prediction of solution flow by machine learning
in AlN solution growth

Nobuhiko Kokubo1, Yosuke Tsunooka1, Shunta Harada1, Miho Tagawa1, Toru Ujihara1 (1.Nagoya Univ.)

Keywords:machine learning, AlN, fluid simulation

Fluid flow is one of the most important parameters for crystal growth. Computational fluid dynamics (CFD) simulation is powerful method to know the solution flow distribution. In order to optimize the growth configuration for the suitable solution flow, it is necessary to exhaustively simulate various kinds of configurations. However, the CFD simulations take a plenty of time. In this study, we applied the sparse modelling which is a variety of machine learning. Keeping AlN solution growth in mind, We performed the rapid prediction of solution flow by using the small number of simulation results.