Scanning of Thermal-Plasma-Jet by Alternating Magnetic Field and Its Application to Semiconductor Substrate Annealing

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and control

Thu. Sep 15, 2016 9:00 AM - 12:30 PM B7 (Exhibition Hall)

Tatsuya Misawa(Saga Univ.), Tatsuo Ishijima(Kanazawa Univ.)

10:45 AM - 11:00 AM

〇Kenji Teramoto¹, Hiroaki Hanafusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

Keywords:Plasma-Jet