[15a-P3-1~13] 3.7 Laser processing

[15a-P3-5] Pulsed laser deposition of TiN thin film by third harmonics of YAG laser

〇Yasushi Oshikane¹, Motohiro Nakano¹, Kensuke Murai² (1.Osaka Univ., 2.AIST)

Keywords:Titanium nitride (TiN) thin film, pulsed laser deposition, surface plasmon polarition

Thin and crystalline film deposition of titanium nirtide (TiN) for plasmonic application has been tested by pulsed laser deposition (PLD) technique. A sintered compact of micronized TiN is used as a target, and the target surface is irradiated by a third harmonics of pusled YAG laser (355nm, 10Hz, max 350mJ/pulse). The PLD process has been done in high vacuum chamber (below 10^-4Pa), and the laser irradiation intensity is arround 10¹⁰W/cm². The plume hits a surface of glass slide as substrate, and the resultant TiN thin film is formed in a matter of several tens of minutes. Physical characterisitcs of the film has been analyzed by (1) X-ray diffractometer (XRD), (2) UV-Vis/Nir spectrophotometer, (3) X-ray photoelectron spectroscopy (XPS), (4) Raman spectroscopy, and etc..