The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[15p-C302-1~18] 15.6 Group IV Compound Semiconductors (SiC)

Thu. Sep 15, 2016 1:45 PM - 7:00 PM C302 (Nikko Houou)

Hidekazu Tsuchida(CRIEPI), Satoshi Tanimoto(Nissan ARC)

6:00 PM - 6:15 PM

[15p-C302-15] Suppression of the forward degradation in 4H-SiC PiN diodes by employing a recombination-enhanced buffer layer

Takeshi Tawara1,2, Tetsuya Miyazawa3, Mina Ryo1,2, Masaki Miyazato1,2, Takumi Fujimoto2, Kensuke Takenaka1,2, Shinichiro Matsunaga1,2, Masaaki Miyajima1,2, Akihiro Otsuki2, Yoshiyuki Yonezawa1, Tomohisa Kato1, Hajime Okumura1, Tsunenobu Kimoto4, Hidekazu Tsuchida3 (1.AIST, 2.Fuji Electric, 3.CRIEPI, 4.Kyoto Univ.)

Keywords:silicon carbide, bipolar degradation, minority carrier lifetime

4H-SiCのPiNダイオードにおいて、少数キャリア寿命の短い厚膜バッファ層をエピ/基板界面に導入してバイポーラ劣化現象の抑制効果を検証した。