The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[15p-C302-1~18] 15.6 Group IV Compound Semiconductors (SiC)

Thu. Sep 15, 2016 1:45 PM - 7:00 PM C302 (Nikko Houou)

Hidekazu Tsuchida(CRIEPI), Satoshi Tanimoto(Nissan ARC)

4:00 PM - 4:15 PM

[15p-C302-8] Characterization of SiC Wafer/Device Using a Laser Terahertz Emission Microscope

Hidetoshi Nakanishi1, Tatsuhiko Nishimura1, Fujikazu Kitamura1, Minoru Mizubata1, Yuji Sakai2, Iwao Kawayama2, Masayoshi Tonouchi2 (1.SCREEN, 2.ILE Osaka Univ.)

Keywords:Terahertz Wave, Wide-gap semiconductor, SiC

A laser terahertz emission microscope (LTEM) is an imaging and spectroscopic technique that measures terahertz(THz) emission from materials and devices excited by femtosecond laser pulses.Last year, we reported visualization of THz emission from the surface of GaN using LTEM.This method enables feasible evaluation of the distribution of non-radiative defects, which are undetectable with photoluminescence.Now,we succeeded in measuring and imaging THz emission from a SiC wafer and device excited by ultraviolet (UV) femtosecond laser pulses.