The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[15p-C302-1~18] 15.6 Group IV Compound Semiconductors (SiC)

Thu. Sep 15, 2016 1:45 PM - 7:00 PM C302 (Nikko Houou)

Hidekazu Tsuchida(CRIEPI), Satoshi Tanimoto(Nissan ARC)

4:15 PM - 4:30 PM

[15p-C302-9] Correlation between shapes of Shockley stacking faults and
structure of basal plane dislocations in 4H-SiC epilayers

〇(M1)Akifumi Iijima1, Jun Suda1, Tsunenobu Kimoto1 (1.Kyoto Univ.)

Keywords:SiC, stacking fault, basal plane dislocation

In SiC crystals, a basal plane dislocation (BPD) is dissociated into two partial dislocations (PDs), where a SF is present between them. It is still not clear why so many shapes of SSFs appear and what is the origin of the many different shapes. In this study, we investigated the growth patterns of SFs originating from BPDs including the segments using a Photoluminescence (PL) imaging technique, and clarified the correlation between shapes of SFs and structure of BPDs. Considering the Burgers vector and the direction of BPDs, we obtained 72 patterns of expanded SFs. The shapes of the expanded SFs which is considered from BPD structure well correspond to experimental results.