[15p-P11-1~12] 15.5 Group IV crystals and alloys

[15p-P11-8] Structure analysis of Si/Si_1-xC_x/Si(001) formed using ion implantation strain relaxation method

〇Taiyo Murakami¹, Keisuke Arimoto¹, Jyunji Yamanaka¹, Kosuke Hara¹, Chiaya Yamamoto², Noritaka Usami³, Yusuke Hoshi³, You Arisawa³, Kentarou Sawano⁴, Kiyokazu Nakagawa¹ (1.CCST Univ. of Yamanashi, 2.CCT Univ. of Yamanashi, 3.Nagoya Univ., 4.Tokyo City Univ.)

Keywords:semiconductor