Taiyo Murakami

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Speaker, Author, Co-Author

Thu. Sep 15, 2016 1:30 PM - 3:30 PM P11 (Exhibition Hall)

Poster presentation
| 15 Crystal Engineering
| 15.5 Group IV crystals and alloys

[15p-P11-1~12] 15.5 Group IV crystals and alloys

1:30 PM - 3:30 PM

[15p-P11-8] Structure analysis of Si/Si_1-xC_x/Si(001) formed using ion implantation strain relaxation method

〇Taiyo Murakami¹, Keisuke Arimoto¹, Jyunji Yamanaka¹, Kosuke Hara¹, Chiaya Yamamoto², Noritaka Usami³, Yusuke Hoshi³, You Arisawa³, Kentarou Sawano⁴, Kiyokazu Nakagawa¹ (1.CCST Univ. of Yamanashi, 2.CCT Univ. of Yamanashi, 3.Nagoya Univ., 4.Tokyo City Univ.)