[15p-P6-1~16] 8.3 deposition of thin film and surface treatment

[15p-P6-15] DLC On-site Deposition by Atmospheric-Pressure Pen-like Plasma

〇Hiroyuki Yoshiki¹, Yuma Sagai^1,2 (1.Tsuruoka NCT, 2.Orix Facil.)

Keywords:atmospheric-pressure microplasma, DLC films, plasma CVD

A pen-like plasma source has been proposed to achieve the on-site DLC deposition. The plasma was generated by RF (13.56 MHz) excitation of a surgical needle electrode. DLC thin films were synthesized on Si substrate by plasma CVD using a gas mixture of CH₄ and He. The film characteristic depended significantly on the plasma-substrate distance; d. Raman spectroscopy showed two broad peaks of D-band and G-band and FT-IR spectrum revealed that the films consist of sp² and sp³ bondings with large H atoms. The maximum value of HIT was 11.1 GPa (Hv: 1052) at d = 1 mm. On the other hand, the films deposited at d = 10 mm were glassy carbon-like.