Photoemission Study of Remote Plasma CVD SiO<sub>2</sub>/GaN Interfaces

Presentation information

Oral presentation

13 Semiconductors » 13.8 Compound and power electron devices and process technology

Fri. Sep 16, 2016 9:00 AM - 12:30 PM B1 (Exhibition Hall)

Taketomo Sato(Hokkaido Univ.)

11:45 AM - 12:00 PM

〇TRUYEN XUAN NGUYEN¹, Akio Ohta¹, Katsunori Makihara¹, Mitsuhisa Ikeda¹, Seichi Miyazaki¹ (1.Nagoya Univ.)

Keywords:SiO2/GaN Interface, Remote Plasma CVD