Characterization of Oxide Film Density on SiC

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

Fri. Sep 16, 2016 9:00 AM - 12:15 PM C302 (Nikko Houou)

Koji Kita(Univ. of Tokyo)

9:00 AM - 9:15 AM

〇Nozomu Iitsuka¹, Koudai Ozawa¹, Ryu Hasunuma¹, Kikuo Yamabe¹ (1.Univ. of Tsukuba)

Keywords:SiC, insulator, film density