9:15 AM - 9:30 AM
[16a-C302-2] Characterization of thermal SiO2/SiC interfacial transitional layer
Keywords:SiC, Dielectric film, SiO2/SiC interface
Oral presentation
15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)
Fri. Sep 16, 2016 9:00 AM - 12:15 PM C302 (Nikko Houou)
Koji Kita(Univ. of Tokyo)
9:15 AM - 9:30 AM
Keywords:SiC, Dielectric film, SiO2/SiC interface