The 77th JSAP Autumn Meeting, 2016

Presentation information

Print

Poster presentation

13 Semiconductors » 13.3 Insulator technology

[16a-P4-1~8] 13.3 Insulator technology

Fri. Sep 16, 2016 9:30 AM - 11:30 AM P4 (Exhibition Hall)

9:30 AM - 11:30 AM

▲ [16a-P4-3] Effect of Added Organic Solution on Low-Temperature Deposition of SiOx Films by APCVD using Silicone Oil and Ozone Gas

〇(D)Puneet Jain1, Susumu Horita1 (1.Japan Adv. Inst. Sci. & Tech. (JAIST))

Keywords:Silicon Oxide Film, Low-Temperature Deposition, APCVD

SiOx films are formed by APCVD using silicone oil and ozone. These films have non-negligible amout of Si-OH bonds due to H2O. In order to enhance deposition rate and reduce amount of Si-OH bond, we tried to add some organic solution to silicon oil vapor and O3 gas. Adding organic solution was found to influence the deposition rate strongly and content of Si-OH bond slightly. In the meeting, we will show more detailed data under various deposition conditions and discuss them.