Si epitaxial growth using on-site SiH<sub>4</sub> generator by narrow gap high density hydrogen plasma

Presentation information

Oral presentation

8 Plasma Electronics » 8.3 deposition of thin film and surface treatment

Fri. Sep 16, 2016 1:15 PM - 4:45 PM B7 (Exhibition Hall)

Kazunori Koga(Kyushu Univ.), Keiji Nakamura(Chubu Univ.)

2:45 PM - 3:00 PM

〇(M1)Norihisa Takei¹, Fumiya Shinoda¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹, Hiromasa Ohmi¹ (1.Osaka Univ.)

Keywords:plasma, silane, epitaxial growth