Daisuke Tei

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 9:30 AM - 12:00 PM S224 (S2)

Oral presentation
| 7 Beam Technology and Nanofabrication
| 7.3 Micro/Nano patterning and fabrication

[20a-S224-1~9] 7.3 Micro/Nano patterning and fabrication

10:15 AM - 10:30 AM

[20a-S224-4] The distribution of polarization inside beam of excimer laser for semiconductor lithography tools

〇Daisuke Tei¹, takahito kumazaki¹, hiroaki tsushima¹, akihiko kurosu¹, takeshi ohta¹, takashi matsunaga¹, hakaru mizoguchi¹ (1.Gigaphoton Inc.)