Yuichi Kamimuta

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 1:45 PM - 6:15 PM S221 (S2)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[20p-S221-1~17] 13.3 Insulator technology

5:00 PM - 5:15 PM

[20p-S221-13] Consideration for the process dependence of electrical characteristics by the structural analysis of the ferroelectric HfSiO film using FT-IR method

〇Yuichi Kamimuta¹, Shosuke Fujii¹, Takaishi Riichiro¹, Ino Tsunehiro¹, Nakasaki Yasushi¹, Saitoh Masumi¹, Koyama Masato¹ (1.Toshiba Corp.)